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Literature / Source Database:
International Journal of PIXE
Description
... covering ... various aspects of particle
-induced x-ray emission (PIXE).
| Title (short) |
Int. J. PIXE |
| Languages |
English |
| First year |
1990 |
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Status
active
Indexing
CSA Pollution Abstracts
Subject
Source type
Journal
Publisher
ISBN ISSN
0129-0835
E ISSN
1793-6616
First volume
1
Last volume
22+
Publish city
Singapore
Homepage
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Availability |
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| Text PDF |
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free access |
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| Text Html |
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for subscriber |
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| References |
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not available |
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| Abstracts |
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| TOC |
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Description
International Journal of PIXE is a quarterly journal covering the latest developments in the various aspects of particle-induced X-ray emission (PIXE), including the fundamentals of this process, its applications and the techniques employed in different kinds of applications. It seeks to enhance communication between basic and applied scientists by compiling relevant research papers and review articles which would otherwise be widely dispersed in a number of specialized journals that cover PIXE only as one of the related subjects. The scope of the journal encompasses the following: - Fundamental Aspects
Ion-atom, electron-atom and photon-atom collisions; ionization; X-ray and Auger electron production; solid state effect; excitation-assisted chemical reactions. - Techniques
Microbeam and external-beam techniques; data handling; RBS; synchrotron radiation; sample preparation. - Applications
Biomedical, pharmaceutical, biological, archaeological, geological, environmental, high-technological and industrial applications.
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